High-resolution and large organic Electroluminescent (EL) displays could potentially be on the way thanks to Fujifilm Corporation and imec and their jointly-developed photoresist technology for ogranic semiconductors.
Photoresist technology enables submicron patterning, allowing Fujifilm and imec to successfully demonstrate full-color organic light-emitting diodes (OLED).
Since Organic EL displays are capable of being made thin and flexible, they are commonly used for smartphones, televisions, and wearable devices.
Not only are the displays durable, they also provide superior response time and contrast ratio.
Photoresist technology for organic semiconductors was jointly developed by Fujifilm and imec back in 2013, enabling submicron patterning without damaging the organic semiconductor materials, based on photolithography capable of high-resolution patterning on large substrates.
The technology has garnered a great deal of attention since its inception due to the fact an existing i-line exposure system can be used in association with the new technology.
As a result, no further money needs to be poured into the project and it has the potential to provide a cost-effective way of manufacturing high-resolution organic semiconductor devices.
The latest achievement from Fujifilm and imec shows promise for new opportunities, as they were able to produce full-color OLEDs with the photoresist technology for organic semiconductors and successfully verified their performance.
